MUSTANG VACUUM SYSTEMS, LLC
SARASOTA, FLORIDA

Mustang Roll to Roll systems focus on optimizing and balancing production, roll change time and process for the most effective capital solution to customers manufacturing requirements. Mustang offers pilot or production systems for batch or continuous in line coating operation with maximized capacity. Large format batch style tools designed for industrial manufacturing environments Mustang specializes in designing production solutions for the most complex products. For truly unique, very large scale or highly complex component handling and coating applications, the MVS Advanced Engineering Division is dedicated to tailor our engineering, load/unload, chamber & software layouts to meet any need. An experienced and extensive global network of skilled & knowledgeable service and sales personnel are available at any time to support all production & development demands in the field. • Committed Production Support Production Equipment Ideal for Industrial Scale R&D or Pilot Scale Production. Pilot or Production Manufacturing Production Equipment Designed for free-span deposition of thin films up to 40cm wide (Pilot Production Scale) Designed for deposition of thin films on substrates 40cm to 2m wide (Production Scale) Designed for R&D or low volume production, the Mini Solar is available with a variety of deposition sources. Process Control, Speed, and Performance – Different TCO layers can be formed with a variety of deposition methods. Choosing the appropriate balance between speed and TCO performance for production processes will impact the capital cost for TCO deposition systems. :Sn, ITO) are commonly used, however, other dopants and oxide combinations have been tested. Magnetron sputtering is an industrially proven, large area deposition technique that is typically used to deposit AZO or ITO. When considering a sputtering process, it is important to define your material system and also the type of deposition power. Below are some guiding principles for selecting a TCO for your production process: There has been an ongoing debate on the value of AZO vs. ITO for solar cell applications. Both materials are used in production and selecting either material system is highly dependent on a manufacturer’s production demands and existing technology. For layer thicknesses less than 150 nm, ITO films produce superior conductivity. This means that AZO films must be thicker to achieve the similar TCO properties. In production, ITO films are 3-10 times thinner than AZO films, however, this production advantage is offset by the increased cost for ITO targets. ITO targets can cost 3-6 times that of an equivalent AZO target. Indium is somewhat rare and in high demand in the flat panel display industry, therefore the cost of indium has risen dramatically in the past 10 years. Many companies do not want to optimize their process around ITO and take the risk of higher material costs in the future. Other companies are willing to take the risk of higher material costs to ensure better environmental stability with ITO over AZO. In general both AZO and ITO can be successfully integrated into a thin film solar cell manufacturing process, but recognizing the trade-offs is important. When selecting a deposition power mode, deposition rate, target material, film density, and production capability must all be considered. Magnetron sputtering can be used with a variety of power delivery options, specifically: DC, pulsed DC (p-DC), AC or medium frequency, and RF. The deposition rate is highest with DC sputtering and lowest with RF (Deposition rate: DC > AC > RF), however, the film density follows the inverse trend (Density: RF > AC > DC). DC power is most commonly used with metal or metal alloy targets and is not suitable for insulating targets (such as non-conducting oxides). For insulating or ceramic targets RF power is recommended.